Fine Wire Heating Element

The Laplace four-section heating element is custom-made for photovoltaic heat processing equipment, utilizing a vacuum adsorption process. It uses hard fine wires as the heating element, with single-zone multi-threaded control, offering superior temperature uniformity and product consistency.
The innovative four-section heating element design achieves excellent temperature uniformity and energy savings.
Suitable for diffusion, oxidation, LPCVD, PECVD, and other models.

The Laplace four-section heating element is custom-made for photovoltaic heat processing equipment, utilizing a vacuum adsorption process. It uses hard fine wires as the heating element, with single-zone multi-threaded control, offering superior temperature uniformity and product consistency.
The innovative four-section heating element design achieves excellent temperature uniformity and energy savings.
Suitable for diffusion, oxidation, LPCVD, PECVD, and other models.

Pioneering multi-temperature zone distribution, providing superior temperature uniformity and ultra-long constant temperature working areas.
No overshoot in temperature.
Shortens the process time for rapid heating and cooling.
Capable of reaching higher temperatures, with minimal deformation of the heating element and a longer lifespan.
Does not require a transformer, allowing for flexible temperature control.
Excellent thermal insulation properties of heat insulator, achieving low energy consumption.

Pioneering multi-temperature zone distribution, providing superior temperature uniformity and ultra-long constant temperature working areas.
No overshoot in temperature.
Shortens the process time for rapid heating and cooling.
Capable of reaching higher temperatures, with minimal deformation of the heating element and a longer lifespan.
Does not require a transformer, allowing for flexible temperature control.
Excellent thermal insulation properties of heat insulator, achieving low energy consumption.

Model	LPCVD	PECVD	Boron Diffusion/RP	Boron-Oxidation/OX
Operating Temperature	500℃~700℃	200~600℃	800~1000℃	900℃~1050℃
Heat Insulator	Vacuum Adsorption Process 300kg/m³
Thermal Conductivity (w/M·K)	at 400℃: 0.103 at 600℃: 0.137 at 800℃: 0.164		at 400℃: 0.107 at 600℃: 0.149 at 800℃: 0.179 at 1000℃: 0.233
Temperature Uniformity	at700℃±1℃	at 600℃±1℃	at 1000℃±1℃	at 1050℃±1℃
Heating Element	Wound or Ribbon FeCrAl, directly embedded into heat-resistant materials
Support	Unique Fiber Process Structure
Suitable Tube Size	380-540mm
Lifespan	>18 months	> 24 months	＞12 months	＞12 months

Photovoltaic/Semiconductor Equipment
Low-pressure Horizontal Diffusion System	Low-pressure Horizontal Oxidation Annealing System
Low-pressure Horizontal Chemical Vapor Deposition Coating System (LPCVD)	Plasma Enhanced Chemical Vapor Deposition Coating System (PECVD TWIN)
Horizontal Plasma Enhanced Atomic Layer Deposition Coating System (PEALD)	Plasma Enhanced Chemical Vapor Deposition Horizontal Coating System (PECVD VEGA)
Atomic Layer Deposition System (ALD)	Ultra-High-Temperature Heat Treatment Equipment

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